Thesis
Development and characterization of a reliable 13.5 nm EUV OAM carrying photon beamline
Radiation-matter interactions
Metrology
The Extreme UltraViolet (EUV) photon energy range (10-100 nm) is crucial for many applications spanning from fundamental physics (attophysics, femto-magnetism) to applied domains such as lithography and nanometer scale microscopy. However, there are no natural source of light in this energy domain on Earth because photons are strongly absorbed by matter, requiring thus vacuum environment. People instead have to rely on expensive large-scale sources such as synchrotrons, free electron lasers or plasmas from large lasers. High order laser harmonic generation (HHG), discovered 30 years ago and recognized by the Nobel Prize in Physics in 2023, is a promising alternative as a laboratory scale EUV source. Based on a strongly nonlinear interaction between an ultrashort intense laser and an atomic gas, it results in the emission of EUV pulses with femto to attosecond durations, very high coherence properties and relatively large fluxes. Despite intensive research that have provided a clear understanding of the phenomenon, it has up to know been mostly limited to laboratories. Breaching the gap towards applied industry requires increasing the reliability of the beamlines, subjects to large fluctuations due to the strong nonlinearity of the mechanism, and developing tools to measure and control their properties.
CEA/LIDYL and Imagine Optic have recently joined their expertise in a join laboratory to develop a stable EUV beamline dedicated to metrology and EUV sensors. The NanoLite laboratory, hosted at CEA/LIDYL, is based on a high repetition rate compact HHG beamline providing EUV photons around 40eV. Several EUV wavefront sensors have been successfully calibrated in the past few years. However, new needs have emerged recently, resulting in the need to upgrade the beamline.
The first objective of the PhD will be to install a new HHG geometry to the beamline to enhance its overall stability and efficiency and to increase the photon energy to 92eV, a golden target for lithography. He will then implement the generation of a EUV beam carrying orbital angular momentum and will upgrade Imagine Optic’s detector to characterize its OAM content. Finally, assisted by Imagine Optic engineers, he will develop a new functionality to their wavefront sensors in order to enable large beam characterization.
CEA/LIDYL and Imagine Optic have recently joined their expertise in a join laboratory to develop a stable EUV beamline dedicated to metrology and EUV sensors. The NanoLite laboratory, hosted at CEA/LIDYL, is based on a high repetition rate compact HHG beamline providing EUV photons around 40eV. Several EUV wavefront sensors have been successfully calibrated in the past few years. However, new needs have emerged recently, resulting in the need to upgrade the beamline.
The first objective of the PhD will be to install a new HHG geometry to the beamline to enhance its overall stability and efficiency and to increase the photon energy to 92eV, a golden target for lithography. He will then implement the generation of a EUV beam carrying orbital angular momentum and will upgrade Imagine Optic’s detector to characterize its OAM content. Finally, assisted by Imagine Optic engineers, he will develop a new functionality to their wavefront sensors in order to enable large beam characterization.
SL-DRF-25-0641
Master 2 in physics and/or optics, with compulsary international mobility conditions
October 1 2025
Paris-Saclay
Ondes et Matière (EDOM)
Saclay
CEA
Direction de la Recherche Fondamentale
Institut rayonnement et matière de Saclay
Service Laboratoire Interactions, Dynamique et Lasers
Dynamique et Interactions en phase COndensée