Nanolight facility
The NANOLIGHT platform from LIDYL is located in a new 85 m2 laboratory at the CEA Orme des Merisiers site. Based on an Ytterbium fiber laser with a repetition rate of 100 kHz, pumping an OPCPA system (FASTLITE STARZZ), it delivers three femtosecond beamlines: 1 µm, 46 fs, 300 µJ; 1.8 µm, 40 fs, 15 µJ, CEP stable; 2.4 µm, 80 fs, 13 µJ. An XUV beamline, with photon energies up to 60 eV and a repetition rate of 100 kHz as well as auxiliary equipment are available for a large array of applications, from strong field physics in semiconductors and dielectrics, high order harmonic generation in crystals, ultrafast nanoplasmonics, lensless femtosecond nanometric imaging, wavefront sensing and lithography.
Nano-manufacturing facilities
We master our sample fabrication, from numerical design to nano-patterning. Thanks to a long standing collaboration with the CSNSM in Orsay, we have easy access to a Focused Ion Beam (FIB) instrument. Additionally, we benefit from the proximity with the Institut d’Electronique Fondamental in Orsay, equipped with clean rooms dedicated to nano-manufacturing (e-beam lithography, laser lithography…). A SEM is available in our Institute for sample validation and post experiment analysis.
Lensless Microscopy
The ‘lens-less imaging’ is an original and innovative project, applied and derived from fundamental research. In a more applied approach, and in the context of a collaboration between Imagine Optic and the Laboratory of Interactions, Dynamics and Lasers, we have developed a compact prototype whose principle of operation is lensless imaging.