LIDYL’s NANOLIGHT platform is located in an 85 m² laboratory on the CEA Orme des Merisiers site.
Based on a Ytterbium fiber laser with a 100 kHz repetition rate, pumping an OPCPA system (FASTLITE STARZZ), it delivers three femtosecond beam lines:
- 1 µm, 46 fs, 300 µJ ;
- 1.8 µm, 40 fs, 15 µJ, stable CEP
- 2.4 µm, 80 fs, 13 µJ.
An XUV beamline, with photon energies up to 60 eV and a repetition rate of 100 kHz, and ancillary equipment are available for a wide range of applications, from strong-field physics in semiconductors and dielectrics, to high-order harmonic generation in crystals, ultrafast nanoplasmonics, lens-free femtosecond nanoscale imaging, wavefront detection and lithography.
Nanofabrication facilities
The laboratory masters sample fabrication, from digital design to nanomodeling. In addition, our proximity to the Université Paris-Saclay has opened up a long-standing collaboration with the CSNSM , providing access to a focused ion beam (FIB) source, as well as to C2N‘s clean rooms dedicated to nano-fabrication (electron beam lithography, laser lithography, etc.). A SEM is also available in our Institute for sample validation and post-experimental analysis.
Lens-free microscopy
Lens-free imaging is an original and innovative project, applied and derived from fundamental research. In a more applied approach, and as part of a collaboration between Imagine Optic and the Interactions, Dynamics and Lasers Laboratory, a compact prototype based on lens-free imaging has been developed.