The NANOLIGHT platform from LIDYL is located in a new 85 m2 laboratory at the CEA Orme des Merisiers site. Based on an Ytterbium fiber laser with a repetition rate of 100 kHz, pumping an OPCPA system (FASTLITE STARZZ), it delivers three femtosecond beamlines: 1 µm, 46 fs, 300 µJ; 1.8 µm, 40 fs, 15 µJ, CEP stable; 2.4 µm, 80 fs, 13 µJ. An XUV beamline, with photon energies up to 60 eV and a repetition rate of 100 kHz as well as auxiliary equipment are available for a large array of applications, from strong field physics in semiconductors and dielectrics, high order harmonic generation in crystals, ultrafast nanoplasmonics, lensless femtosecond nanometric imaging, wavefront sensing and lithography.
  

We master our sample fabrication, from numerical design to nano-patterning. Thanks to a long standing collaboration with the CSNSM in Orsay, we have easy access to a Focused Ion Beam (FIB) instrument. Additionally, we benefit from the proximity with the Institut d’Electronique Fondamental in Orsay, equipped with clean rooms dedicated to nano-manufacturing (e-beam lithography, laser lithography…). A SEM is available in our Institute for sample validation and post experiment analysis.

The ‘lens-less imaging’ is an original and innovative project, applied and derived from fundamental research. In a more applied approach, and in the context of a collaboration between Imagine Optic and the Laboratory of Interactions, Dynamics and Lasers, we have developed a compact prototype whose principle of operation is lensless imaging.